Samsung is facing new challenges in high-end foundry: cutting the purchase of High-NA EUV lithography machines, being revealed to be suspending the joint construction of a research center with ASML

According to our website on August 20, Korean media businesskorea published a blog post today (August 20), revealing that Samsung plans to reduce the scale of High-NA EUV procurement, and that the joint research center project with ASML has also encountered many obstacles.

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Source: ASML Samsung signed a memorandum of understanding (MOU) with ASML in December 2023 to establish an EUV joint research center in the South Korean capital area .
This site quoted sources as reporting that Samsung originally planned to purchase Twinscan EXE:5200, EXE:5400 and EXE:5600 three follow-up Twinscan EXE:5000 High-NA lithography machines in the next 10 years, and the latest report It is said that Samsung has notified ASML that it will not only reduce the purchase quantity of Twinscan EXE:5000 series EUV lithography machines, but also only purchase EXE:5200 in the future.
Reports say the decision was made after Vice Chairman Jun Young-hyun was appointed as the new head of the DS (Device Solutions) division and re-examined ongoing projects and investments.
An industry insider familiar with the situation said:
The process of purchasing land to build a research facility in Hwaseong, Gyeonggi Province, as well as the design and approval process were all in progress. However, as Samsung decided to reduce the introduction of equipment, the related process has completely stopped.
Whether the joint research center will be established elsewhere, or whether the establishment itself will be cancelled, will be decided in future discussions.

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