ASML’s first new EUV lithography machine Twinscan NXE:3800E completed installation

Lithography machine manufacturer ASML announced that the first new EUV lithography machine Twinscan NXE:3800E has been successfully installed. This new model will bring higher production efficiency. According to news on March 13, ASML has made this important progress.

▲ ASML related developments on the :3800E’s information page

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In addition to the Twinscan EXE series of High-NA EUV lithography machines under development, ASML is also continuously updating and upgrading its NXE series of traditional numerical aperture EUV lithography machines. The future goal is to launch NXE:4000F in 2025 model

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The last two generations of NXE series models, 3400C and 3600D, are suitable for 7~5 and 5~3 nm node production respectively. German media ComputerBase therefore predicts3800E is expected to support the cutting-edge 3~2 nm process

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According to the 2021 version of the roadmap previously shared by ASML, Twinscan NXE:3800E system will further improve alignment accuracy (Overlay) and production capacity compared to the previous generation 3600D

, and can achieve 195 wafers The hourly throughput of the circle has increased significantly by nearly 22% compared to the 160 pieces of the 3600D, and is expected to reach the target of 220 pieces (corresponding to a 37.5% increase).

▲ 2021 version of ASML lithography machine roadmap. Image source ASML, the same below

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