


According to news from this website on September 6, ASML CEO Peter Wennink recently said in an interview with Reuters that Despite some obstacles from suppliers, the company will still follow the previously set plan to complete the production this year. High NA EUV machines will be delivered before the end of the year.

ASML indicates that the volume of a high-numerical aperture EUV lithography (High-NA EUV) equipment is equivalent to that of a truck. Each equipment The price is more than US$300 million (note on this site: currently about 2.19 billion yuan), which can meet the needs of first-line chip manufacturers and can manufacture smaller and better chips in the next ten years.
Wennink said some suppliers were unable to improve the quantity and quality of components, leading to minor delays, but overall these difficulties were manageable, with the company promising to deliver the first machine before the end of the year.
This site previously reported that for the post-3nm era, ASML and its partners are developing a new EUV lithography machine-Twinscan EXE:5000 series, which will have 0.55 NA (high NA) The lens has a resolution of 8nm, thereby avoiding double or multiple exposures as much as possible at the 3 nm and above nodes.
Related reading:
"ASML shares the latest progress of High-NA EUV lithography machine: Target to enter the factory in 2024-2025"
Advertising statement: External information contained in this article Jump links (including but not limited to hyperlinks, QR codes, passwords, etc.) are used to convey more information and save selection time. The results are for reference only. All articles on this site include this statement.
The above is the detailed content of ASML CEO promises to deliver the first High-NA EUV lithography machine by the end of the year: it is about the same size as a truck and costs $300 million each. For more information, please follow other related articles on the PHP Chinese website!

本站9月6日消息,ASML首席执行官PeterWennink近日在接受路透社采访时表示,尽管供应商出现了一些阻碍,但公司仍会按照此前设定的计划,在今年年底之前交付HighNAEUV机器。ASML表示一台高数值孔径EUV光刻(High-NAEUV)设备的体积和卡车相当,每台设备的售价超过3亿美元(本站备注:当前约21.9亿元人民币),可以满足一线芯片制造商的需求,可以在未来十年内制造更小、更好的芯片。Wennink表示部分供应商无法提高组件的数量和质量,因此导致了轻微的延误,但整体而言这些困难都可

7月1日消息,据小编了解,光刻机领导者ASML公司近日回应了关于其旗下DUV光刻机出口认可的问题,进一步澄清了相关规定和时间表。根据ASML的表态,出口管制条例仅适用于一些最新型号的DUV光刻机,特别是包括TWINSCANNXT:2000i及其后续推出的浸润式光刻系统。而EUV光刻机在之前已经受到了限制,其他类型的光刻机发运并未受到管控。ASML强调,这一管制规定将于9月1日正式生效,而公司已经积极向相关部门提交了许可申请,以确保业务的正常进行。因此,在9月1日之前发货的DUV光刻机不受影响,业

本站2月2日消息,ASML首席财务官RogerDassen近日接受了荷兰当地媒体Bits&Chips的采访。在采访中,Dassen回应了分析机构SemiAnalysis的质疑,表示High-NA(高数值孔径)EUV(极紫外光)光刻机仍是未来最经济的选择。SemiAnalysis之前刊发文章,认为High-NA光刻技术将使用更高的曝光剂量,从而明显降低单位时间内的晶圆吞吐量。这就意味着,相较于沿用现有的0.33NAEUV光刻机并搭配多重曝光,引入High-NA在近期不会带来成本优势。Dassen认

三星计划增加进口更多ASML极紫外(EUV)光刻设备,这是根据韩国今日电子新闻的报道尽管合同中的保密条款没有透露具体细节,但根据证券市场的消息,这项协议将使得ASML在五年内提供总共50套设备,每台设备的单价约为2000亿韩元(约合11.02亿元人民币),总价值可达10万亿韩元(约合551亿元人民币)目前尚不清楚其合同中的产品是现有EUV光刻设备还是下一代“HighNAEUV”光刻设备。不过,目前EUV光刻设备最大的问题是产量有限。据官方介绍,它“比卫星部件还复杂”,每年只能生产很有限的数量。据

光刻机是法国人Nicephore niepce(尼埃普斯)于1822年发明的;起初是Nicephore niepce发现了一种能够刻在油纸上的印痕,当其出现在了玻璃片上后,经过一段时间的暴晒,透光的部分就会变得很硬,但是在不透光的部分可以用松香和植物油将其洗掉。

光刻机制造商ASML宣布首台新款EUV光刻机TwinscanNXE:3800E已成功安装完毕,此新机型将带来更高的生产效率。根据3月13日的消息称,ASML公司取得了这一重要进展。▲ASML在X平台上的相关动态本站查询发现,ASML官网尚未上线TwinscanNXE:3800E的信息页面。除了正在研发的High-NAEUV光刻机TwinscanEXE系列,ASML也为其NXE系列传统数值孔径EUV光刻机持续更新升级,未来目标在2025年推出NXE:4000F机型。上两代NXE系列机型3400C和

据报道,佳能公司于11月6日宣布,一直在投资新兴的芯片制造技术纳米压印(Nano-imprintLithography,NIL),并计划将新型芯片制造设备的价格定在阿斯麦最好光刻机的一小部分之内,以此在光刻机领域取得进展纳米压印技术是极紫外光刻(EUV)技术的低成本替代品。佳能首席执行官御手洗富士夫(FujioMitarai)表示,该公司最新的纳米压印技术将为小型芯片制造商生产先进芯片开辟出一条道路。“这款产品的价格将比阿斯麦的EUV少一位数,”现年88岁的御手洗富士夫表示。这是他第三次担任佳能

本站6月20日消息,市场调查机构CounterpointResearch今天发布博文表示,由于客户推迟了对前沿半导体的投资,2024年第1季度全球前五大晶圆设备(WFE)制造商的收入同比下降了9%。本站注:在前五名中,ASML收入环比分别下降21%、同比下降26%,KLA环比下降14%,同比下降5%。与2023年相比,应用材料公司、LamResearch公司和KLA公司的收入环比降幅为个位数。主要得益于中国DRAM出货量的增加,2024年第1季度前五大WFE制造商来自中国的收入同比增长116%。


Hot AI Tools

Undresser.AI Undress
AI-powered app for creating realistic nude photos

AI Clothes Remover
Online AI tool for removing clothes from photos.

Undress AI Tool
Undress images for free

Clothoff.io
AI clothes remover

AI Hentai Generator
Generate AI Hentai for free.

Hot Article

Hot Tools

VSCode Windows 64-bit Download
A free and powerful IDE editor launched by Microsoft

SublimeText3 Mac version
God-level code editing software (SublimeText3)

Zend Studio 13.0.1
Powerful PHP integrated development environment

mPDF
mPDF is a PHP library that can generate PDF files from UTF-8 encoded HTML. The original author, Ian Back, wrote mPDF to output PDF files "on the fly" from his website and handle different languages. It is slower than original scripts like HTML2FPDF and produces larger files when using Unicode fonts, but supports CSS styles etc. and has a lot of enhancements. Supports almost all languages, including RTL (Arabic and Hebrew) and CJK (Chinese, Japanese and Korean). Supports nested block-level elements (such as P, DIV),

SAP NetWeaver Server Adapter for Eclipse
Integrate Eclipse with SAP NetWeaver application server.
