SK Hynix plans to introduce ASML High NA EUV lithography machine for the first time in 2026

News from this website on August 19. According to Korean media ZDNet Korea, SK Hynix EUV material technicians told the media when attending a technical meeting on the 12th local time of this month that the company plans to introduce ASML’s High NA EUV for the first time in 2026. Lithography machine. An engineer from SK Hynix said that the company has recently established a High NA EUV R&D team and is working on applying High NA EUV lithography technology to the production of state-of-the-art DRAM memory.

According to reports on this site, among several major advanced logic process and storage semiconductor companies,

1. Intel:

   • has taken the lead in acquiring the world’s first commercial High NA EUV lithography machine
   • Two High NA machines are already on their way to the Oregon R&D fab

2. TSMC:

   • The first High NA EUV lithography machine is expected to be delivered in 2024

3. Samsung Electronics:

   • The first High NA EUV lithography machine is expected to be delivered from the fourth quarter of 2024 to the first quarter of 2025

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