The role of photoresist

Photoresist is used to transfer circuit design patterns to wafers and is a key material in semiconductor manufacturing. Its function is to make the light-receiving part insoluble in the developer, thereby achieving pattern transfer. According to photosensitivity, photoresists are divided into positive (used to make circuit lines) and negative (used to make circuit spaces). It is widely used in integrated circuits, microelectronic devices, printed circuit boards and optical instrument manufacturing and other fields.

The role of photoresist

Photoresist is the key to making integrated circuits in the semiconductor manufacturing process Material. Its function is to transfer the circuit design pattern to the wafer.

The principle of photoresist

Photoresist is an organic polymer that is sensitive to ultraviolet light or electron beams. When light strikes the photoresist, the polymer becomes cross-linked and becomes insoluble in the developer. The unirradiated portion remains soluble.

The manufacturing process of photoresist

The manufacturing process of photoresist includes the following steps:

• Synthetic polymer
• Add photosensitizer
• Dissolve the polymer in the solvent
• Filter and degas
• Coat on the wafer

Types of photoresist

According to the sensitivity of photoresist to light, it can be divided into positive photoresist and negative photoresist:

• Positive photoresist: The polymer formed after irradiation becomes insoluble in the developer and is used to make circuit lines.
• Negative photoresist: The polymer formed after irradiation becomes soluble in the developer and is used to create circuit space.

Application of photoresist

Photoresist is widely used in:

• Integrated circuit manufacturing
• Microelectronic device production
• Printed circuit board manufacturing
• Optical instrument manufacturing

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