Home >Technology peripherals >It Industry >ASML announces the launch of high NA lithography machines suitable for manufacturing 2nm chips, Intel has purchased 6 units
According to news on December 19, SamMobile reported that ASML will launch chip manufacturing equipment for the 2nm process node in the next few months, which will increase the optical numerical aperture (NA) performance from 0.33 to 0.55. Samsung plans to start producing 2nm chips at the end of 2025
According to reports, Dutch semiconductor equipment manufacturer ASML is said to plan to have a production capacity of only 10 units next year. However, Intel has already pre-ordered 6 of them. Nonetheless, ASML plans to increase the production capacity of this equipment to 20 units per year in the next few years
Currently, the EUV light listed on ASML’s official website There are two engraving machines, namely NXE:3600D and NXE:3400C. Both lithography machines are equipped with 0.33 NA reflective projection optics and 13.5nm EUV light source, which are suitable for the manufacturing of 3/5nm and 5/7nm chips respectively
According to an ASML spokesperson, EXE:5200 is ASML’s next-generation high NA system, with higher lithography resolution and the ability to shrink chips to 1.7 ratio, and increase the density to 2.9 times
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