What is the difference between EUV and DUV?

The difference between euv and duv: 1. Duv can basically only achieve 25nm, while euv can meet the manufacturing requirements of wafers below 10nm; 2. Duv mainly uses the refraction principle of light, while euv uses the refraction principle of light. Reflection principle, the interior must be operated in a vacuum.

#The operating environment of this article: Windows 7 system, Dell G3 computer.

The difference between euv and duv:

1. Different process ranges

duv: basically can only achieve 25nm, Intel achieved 10nm with its dual workbench model, but was unable to reach below 10nm.

euv: It can meet the requirements of wafer manufacturing below 10nm, and can continue to extend to 5nm and 3nm.

2. Different luminescence principles

duv: The light source is an excimer laser, and the wavelength of the light source can reach 193 nanometers.

euv: Laser excites plasma to emit EUV photons, and the wavelength of the light source is 13.5 nanometers.

3. Different light path systems

duv: Mainly uses the principle of refraction of light. Among them, the immersion lithography machine fills deionized water between the projection lens and the wafer, making the 193nm light wave equivalent to 134nm.

euv: Utilizing the principle of light reflection, the interior must be operated in a vacuum.

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