Intel once again confirms the future Intel 10A node, the second High NA EUV lithography machine is coming

This site reported on August 2 that Intel CEO Pat Gelsinger once again confirmed the existence of Intel 10A, a process node that has not yet been officially announced, during an investor conference call after the release of the second quarter financial report for fiscal year 2024.

He said:

In addition to Intel 18A, we are also advancing the development of Intel 14A and Intel 10A.

…

As we transfer Intel 4 and 3 production capacity to Ireland (the mass production wafer fab), our TD (this site’s note: Technology Development, technology development) team can also focus more on 18A, Work on nodes 14A and 10A.

Intel officially mentioned the Intel 10A process for the first time in a closed-door event at the IFS Direct Connect conference in February this year. Screenshots of the slides displayed at the time showed that Intel 10A is expected to contribute production capacity starting in 2028:

According to the existing process planning, Intel 10A will become the second generation of Intel’s advanced process to introduce High NA EUV lithography after Intel 14A.

For Intel 14A, Pat Gelsinger claimed that the process, which will be launched no earlier than 2025, is progressing smoothly.

As for the ASML High NA EUV lithography machine that supports Intel's 14A and 10A two-generation processes, after Intel completed the assembly of the world's first commercial High NA EUV lithography machine in April this year, Intel's second High NA EUV lithography machine The engraving machine is also about to arrive at the Oregon R&D fab.

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